Residue formation in MHM-based low-k etch

Goossens, DannyDannyGoossensde Marneffe, Jean-FrancoisJean-Francoisde MarneffeConard, ThierryThierryConardHendrickx, DirkDirkHendrickxStruyf, HerbertHerbertStruyfBoullart, WernerWernerBoullart2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/13788Residue formation in MHM-based low-k etchOral presentation