A year of new mask defectivity insights in imec's EUVL program

Jonckheere, RikRikJonckheereVan Den Heuvel, DieterDieterVan Den HeuvelBaudemprez, BartBartBaudemprezJehoul, ChristianeChristianeJehoulPacco, AntoineAntoinePacco2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/22555A year of new mask defectivity insights in imec's EUVL programProceedings paperwww.sematech.org/10386