De Simone, DaniloDaniloDe SimoneSayan, SafakSafakSayanDei, SatoshiSatoshiDeiPollentier, IvanIvanPollentierKuwahara, YuheiYuheiKuwaharaVandenberghe, GeertGeertVandenbergheNafus, KathleenKathleenNafusShiratani, MotohiroMotohiroShirataniNakagawa, HisashiHisashiNakagawaNaruoka, TakehikoTakehikoNaruoka2021-10-232021-10-232016https://imec-publications.be/handle/20.500.12860/26513Novel metal containing resists for EUV lithography extendibilityProceedings paperhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2505770