Comparison of Bosch and cryogenic processes for patterning high aspect ration features in silicon

Walker, M. J.M. J.Walkerde Boer, M. J.M. J.de BoerJansen, HenriHenriJansen2021-10-142021-10-142001https://imec-publications.be/handle/20.500.12860/5829Comparison of Bosch and cryogenic processes for patterning high aspect ration features in siliconProceedings paper