Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresists

Vesters, YannickYannickVesters2021-10-272021-10-272019-04https://imec-publications.be/handle/20.500.12860/34388Light-matter interactions in photoresists for Extreme Ultraviolet Lithography. From conventional chemically amplified resists to alternative photoresistsPHD thesishttps://limo.libis.be/primo-explore/fulldisplay?docid=LIRIAS2379237&context=L&vid=Lirias&search_scope=Lirias&tab=default_tab&lang=en_US&fromSitemap=1