Characterisation of HF-last cleaning of ion-implanted Si surfaces

Kondoh, EiichiEiichiKondohBaklanov, MikhaïlMikhaïlBaklanovJonckx, FrankyFrankyJonckxMaex, KarenKarenMaex2021-09-302021-09-301998https://imec-publications.be/handle/20.500.12860/2675Characterisation of HF-last cleaning of ion-implanted Si surfacesJournal article