Heyns, MarcMarcHeynsBeckx, StephanStephanBeckxCaymax, MattyMattyCaymaxClaes, MartineMartineClaesDe Gendt, StefanStefanDe GendtDegraeve, RobinRobinDegraeveDelabie, AnneliesAnneliesDelabieDeweerd, WimWimDeweerdGroeseneken, GuidoGuidoGroesenekenHooker, JacobJacobHookerHoussa, MichelMichelHoussaKwak, Dong HwaDong HwaKwakLander, RobRobLanderLujan, GuilhermeGuilhermeLujanMaes, JanJanMaesNiwa, MasaakiMasaakiNiwaPantisano, LuigiLuigiPantisanoPuurunen, R.R.PuurunenRagnarsson, Lars-AkeLars-AkeRagnarssonRohr, ErikaErikaRohrSchram, TomTomSchramVan Elshocht, SvenSvenVan ElshochtVandervorst, WilfriedWilfriedVandervorst2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9029ALD deposition of high-k and metal gate stacks for advanced CMOS applicationsProceedings paper