Liu, Hua-YuHua-YuLiuZhao, Q.Q.ZhaoChen, J.F.J.F.ChenJiang, J.J.JiangSocha, B.B.SochaVan Setten, E.E.Van SettenEngelen, A.A.EngelenMeessen, J.J.MeessenCrouse, M.M.M.M.CrouseFeng, M.M.FengShao, W.W.ShaoCao, H.H.CaoCao, Y.Y.CaoVan Look, LieveLieveVan LookBekaert, JoostJoostBekaertVandenberghe, GeertGeertVandenbergheFinders, JoJoFinders2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14049Separable models for computational lithographyProceedings paper