Bailey, GeorgeGeorgeBaileyTritchkov, AlexanderAlexanderTritchkovPark, Jea-WooJea-WooParkHong, LeLeHongWiaux, VincentVincentWiauxHendrickx, EricEricHendrickxVerhaegen, StafStafVerhaegenXie, PengPengXieVersluijs, JankoJankoVersluijs2021-10-162021-10-162007https://imec-publications.be/handle/20.500.12860/11678Double patterning EDA solutions for the 32nm HP and beyondProceedings paperww.spie.org