High NA EUV: a challenge for metrology, an opportunity for atomic force microscopy

Moussa, AlainAlainMoussaSeveri, SimoneSimoneSeveriLorusso, GianGianLorussoDe Simone, DaniloDaniloDe SimoneCharley, Anne-LaureAnne-LaureCharley2022-05-252022-05-222022-05-252021978-1-5106-4552-30277-786XWOS:000792657300016https://imec-publications.be/handle/20.500.12860/39863High NA EUV: a challenge for metrology, an opportunity for atomic force microscopyProceedings paper10.1117/12.2601677978-1-5106-4553-0WOS:000792657300016