Influence of the As and BF2 junction implantation on the stress induced defects during the Ti- and Co/Ti-silicidation

Steegen, AnAnSteegenBender, HugoHugoBenderDe Wolf, IngridIngridDe WolfMaex, KarenKarenMaex2021-10-142021-10-141999https://imec-publications.be/handle/20.500.12860/3851Influence of the As and BF2 junction implantation on the stress induced defects during the Ti- and Co/Ti-silicidationProceedings paper