Impact of STI width and spacing on the stress generation in deep submicron CMOS

Poyai, A.A.PoyaiRittaporn, I.I.RittapornSimoen, EddyEddySimoenClaeys, CorCorClaeysRooyackers, RitaRitaRooyackers2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/9461Impact of STI width and spacing on the stress generation in deep submicron CMOSProceedings paper