Le, Quoc ToanQuoc ToanLeChiodarelli, NicoloNicoloChiodarelliBlum, IvanIvanBlumKesters, ElsElsKestersLux, MarcelMarcelLuxClaes, MartineMartineClaesVereecke, GuyGuyVereeckeMertens, PaulPaulMertens2021-10-162021-10-162007-04https://imec-publications.be/handle/20.500.12860/12453Cleaning of post-etch photoresist layer on patterned surface using organic solvent combined with physical forcesProceedings paper