Electromigration in Nano-Interconnects: Determining Reliability Margins in Redundant Mesh Networks Using a Scalable Physical-Statistical Hybrid Paradigm

Zahedmanesh, HoumanHoumanZahedmanesh2025-01-212024-09-172025-01-2120242072-666XWOS:001305745200001https://imec-publications.be/handle/20.500.12860/44513Electromigration in Nano-Interconnects: Determining Reliability Margins in Redundant Mesh Networks Using a Scalable Physical-Statistical Hybrid ParadigmJournal article10.3390/mi15080956WOS:001305745200001COPPER INTERCONNECTSTRESS EVOLUTIONVOID NUCLEATIONMODELMICROSTRUCTUREFILMSMEDLINE:39203607