In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfaces

Adelmann, ChristophChristophAdelmannTallarida, MassimoMassimoTallaridaCuypers, DanielDanielCuypersRodriguez, LeonardLeonardRodriguezMichling, MarcelMarcelMichlingFriedrich, DanielDanielFriedrichDe Clercq, AstridAstridDe ClercqDelabie, AnneliesAnneliesDelabieConard, ThierryThierryConardVan Elshocht, SvenSvenVan ElshochtLocquet, Jean-PierreJean-PierreLocquetSchmeisser, DieterDieterSchmeisserCaymax, MattyMattyCaymax2021-10-202021-10-202012https://imec-publications.be/handle/20.500.12860/20257In-situ studies of the chemistry of trimethyl-aluminum on III-V semiconductor surfacesMeeting abstract