Influence op O2/H2 plasma substrate pre-treatment on the charge carrier parameters of (100) homepitaxial CVD diamond films

Deferme, W.W.DefermeMalinauskas, T.T.MalinauskasJarasiunas, K,K,JarasiunasNesladek, MilosMilosNesladekHaenen, KenKenHaenen2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/16995Influence op O2/H2 plasma substrate pre-treatment on the charge carrier parameters of (100) homepitaxial CVD diamond filmsMeeting abstract