Bekaert, JoostJoostBekaertBaskaran, BalakumarBalakumarBaskaranVan Look, LieveLieveVan LookFranke, Joern-HolgerJoern-HolgerFrankePhilipsen, VickyVickyPhilipsenNiroomand, ArdavanArdavanNiroomandHendrickx, EricEricHendrickxKomami, HideakiHideakiKomamiOkawa, TatsuroTatsuroOkawaShida, SoichiSoichiShidaKojima, ShinichiShinichiKojimaIwai, ToshimichiToshimichiIwai2025-06-202024-11-162025-06-202024978-1-5106-8288-70277-786XWOS:001327624200013https://imec-publications.be/handle/20.500.12860/44791High-NA EUV mask pattern characterization using advanced mask CD-SEM metrologyProceedings paper10.1117/12.3029528978-1-5106-8289-4WOS:001327624200013