Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment

De Schepper, PeterPeterDe SchepperVaglio Pret, AlessandroAlessandroVaglio PretEl Otell, ZiadZiadEl OtellHansen, TerjeTerjeHansenAltamirano Sanchez, EfrainEfrainAltamirano SanchezDe Gendt, StefanStefanDe Gendt2021-10-222021-10-2220151612-8850https://imec-publications.be/handle/20.500.12860/25152Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatmentJournal articlehttp://onlinelibrary.wiley.com/doi/10.1002/ppap.201400078/abstract