Engineering of the polysilicon emitter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster tool

Decoutere, StefaanStefaanDecoutereCuthbertson, AlanAlanCuthbertsonWilhelm, RudiRudiWilhelmVandervorst, WilfriedWilfriedVandervorstDeferm, LudoLudoDeferm2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/612Engineering of the polysilicon emitter interfacial layer using low temperature thermal re-oxidation in an LPCVD cluster toolProceedings paper