Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithography

Ishimoto, ToruToruIshimotoYasui, NaokiNaokiYasuiHasegawa, NorioNorioHasegawaTanaka, MakiMakiTanakaCheng, ShauneeShauneeCheng2021-10-182021-10-182010https://imec-publications.be/handle/20.500.12860/17308Study on practical application of pattern top resist loss measurement by CD-SEM for high NA immersion lithographyProceedings paper