Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutions

Li, LiLiLiBender, HugoHugoBenderTrenkler, ThomasThomasTrenklerMertens, PaulPaulMertensMeuris, MarcMarcMeurisVandervorst, WilfriedWilfriedVandervorstHeyns, MarcMarcHeyns2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/722Surface passivation and microroughness of (100) silicon etched in aqueous hydrogen halide (HF, HCl, HBr, Hl) solutionsJournal article