Printability of hard and soft defects in 193-nm lithography

Philipsen, VickyVickyPhilipsenJonckheere, RikRikJonckheereKohlpoth, StephanieStephanieKohlpothFriedrich, Christoph M.Christoph M.FriedrichTorres, Juan AndresJuan AndresTorres2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6719Printability of hard and soft defects in 193-nm lithographyProceedings paper