Low-frequency-noise-based oxide trap profiling in replacement high-k/metal-gate pMOSFETs

Simoen, EddyEddySimoenLee, Jae WooJae WooLeeVeloso, AnabelaAnabelaVelosoParaschiv, VasileVasileParaschivHoriguchi, NaotoNaotoHoriguchiClaeys, CorCorClaeys2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/23088Low-frequency-noise-based oxide trap profiling in replacement high-k/metal-gate pMOSFETsMeeting abstract