Enhancement of DOF through RET and mask manufacturability in high-NA EUV

Hwang, SoobinSoobinHwangGillijns, WernerWernerGillijnsDe Gendt, StefanStefanDe GendtKim, Ryan Ryoung HanRyan Ryoung HanKim2025-07-312025-07-312025978-1-5106-8636-60277-786XWOS:001517345700012https://imec-publications.be/handle/20.500.12860/45985Enhancement of DOF through RET and mask manufacturability in high-NA EUVProceedings paper10.1117/12.3055034978-1-5106-8637-3WOS:001517345700012