Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm node

Vleeming, BertBertVleemingHeskamp, B.B.HeskampFinders, JoJoFindersJaenen, PatrickPatrickJaenen2021-10-142021-10-142000https://imec-publications.be/handle/20.500.12860/4924Applying dipole illumination to characterize the imaging performance of 193nm photoresists for the 100nm nodeOral presentation