Selective Ru ALD as a catalyst for sub 7nm bottom-up metal interconnects

Zyulkov, IvanIvanZyulkovKrishtab, MikhailMikhailKrishtabDe Gendt, StefanStefanDe GendtArmini, SilviaSilviaArmini2021-10-242021-10-2420171944-8244https://imec-publications.be/handle/20.500.12860/30046Selective Ru ALD as a catalyst for sub 7nm bottom-up metal interconnectsJournal articlehttp://pubs.acs.org/doi/abs/10.1021/acsami.7b07811