Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometry

Hellin, DavidDavidHellinDelabie, AnneliesAnneliesDelabiePuurunen, RiikkaRiikkaPuurunenConard, ThierryThierryConardDe Gendt, StefanStefanDe GendtVinckier, ChrisChrisVinckier2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7645Chlorine detection and quantification in ALCVD HfO2 high-k dielectric films using total reflection X-ray fluorescence spectrometryMeeting abstract