Local mechanical stress induced during Ti- and Co/Ti silicidation reaction in sub-0.25 µm MOS technologies

Steegen, AnAnSteegenDe Wolf, IngridIngridDe WolfBender, HugoHugoBenderMaex, KarenKarenMaex2021-10-012021-10-011998https://imec-publications.be/handle/20.500.12860/2972Local mechanical stress induced during Ti- and Co/Ti silicidation reaction in sub-0.25 µm MOS technologiesOral presentation