Influence of the antireflection coating on the electromigration resistance of 0.5 µm technology metal-2 line structures

Stevens, RudiRudiStevensWitvrouw, AnnAnnWitvrouwRoussel, PhilippePhilippeRousselMaex, KarenKarenMaexMeynen, HermanHermanMeynenCuthbertson, AlanAlanCuthbertson2021-09-292021-09-291995https://imec-publications.be/handle/20.500.12860/900Influence of the antireflection coating on the electromigration resistance of 0.5 µm technology metal-2 line structuresJournal article