Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantation

Collart, E.J.H.E.J.H.CollartKirkwood, D.D.KirkwoodLindsay, RichardRichardLindsayVandervorst, WilfriedWilfriedVandervorstPawlak, BartekBartekPawlak2021-10-152021-10-152004https://imec-publications.be/handle/20.500.12860/8709Ultra-shallow junction process development for the 45nm CMOS technology node using co-implantationOral presentation