Verdonck, PatrickPatrickVerdonckAresti, MaitaneMaitaneArestiFerchichi, AbdelkarimAbdelkarimFerchichiVan Besien, ElsElsVan BesienStafford, BenBenStaffordTrompoukis, ChristosChristosTrompoukisDe Roest, DavidDavidDe RoestBaklanov, MikhaïlMikhaïlBaklanov2021-10-192021-10-1920110167-9317https://imec-publications.be/handle/20.500.12860/20050The influence of N containing plasmas on low-k filmsJournal article