Cleaning and surface preparation for SiGe and Ge channel device

Wada, MMWadaTakahashi, HHTakahashiSnow, JJSnowVos, RitaRitaVosMertens, PaulPaulMertensShirakawa, HHShirakawa2021-10-192021-10-192010https://imec-publications.be/handle/20.500.12860/18320Cleaning and surface preparation for SiGe and Ge channel deviceMeeting abstract