Understanding oxide degradation mechanisms in ultra-thin SiO2 through high-speed, high-resolution in-situ measurements

Aresu, S.S.AresuDe Ceuninck, WardWardDe CeuninckDegraeve, RobinRobinDegraeveKaczer, BenBenKaczerKnuyt, G.G.KnuytDe Schepper, LucLucDe Schepper2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/10021Understanding oxide degradation mechanisms in ultra-thin SiO2 through high-speed, high-resolution in-situ measurementsJournal article