Semi-Additive Fine Pitch RDL Litho-Process Development of 1000nm CD using low-NA 300mm i-line Stepper

Wang, LiliLiliWangPak, MuratMuratPakPinho, NelsonNelsonPinhoSlabbekoorn, JohnJohnSlabbekoornMiller, AndyAndyMillerBeyne, EricEricBeyne2025-04-162025-02-152025-04-162024979-8-3503-9037-72687-9700WOS:001340802800046https://imec-publications.be/handle/20.500.12860/45207Semi-Additive Fine Pitch RDL Litho-Process Development of 1000nm CD using low-NA 300mm i-line StepperProceedings paper10.1109/ESTC60143.2024.10712041979-8-3503-9036-0WOS:001340802800046