Imaging validation for LS of dark field low-n vs Ta-based absorber masks

Kovalevich, TatianaTatianaKovalevichVan Look, LieveLieveVan LookMoussa, AlainAlainMoussaFranke, Joern-HolgerJoern-HolgerFrankePhilipsen, VickyVickyPhilipsen2024-04-162024-01-132024-04-162023978-1-5106-6748-80277-786XWOS:001125089900004https://imec-publications.be/handle/20.500.12860/43402Imaging validation for LS of dark field low-n vs Ta-based absorber masksProceedings paper10.1117/12.2687549978-1-5106-6749-5WOS:001125089900004