Solid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low-k dielectric films

Abell, ThomasThomasAbellHouthoofd, KristofKristofHouthoofdIacopi, FrancescaFrancescaIacopiGrobet, PietPietGrobetMaex, KarenKarenMaex2021-10-162021-10-162005https://imec-publications.be/handle/20.500.12860/9991Solid state MAS NMR spectroscopic characterization of plasma damage and UV modification of low-k dielectric filmsProceedings paper