Si+ ion implantation for strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructures

Buca, DanielDanielBucaMinamisawa, R.A.R.A.MinamisawaTrinkaus, HHTrinkausMantl, SSMantlLoo, RogerRogerLooCaymax, MattyMattyCaymax2021-10-172021-10-1720090021-8979https://imec-publications.be/handle/20.500.12860/15057Si+ ion implantation for strain relaxation of pseudomorphic Si1-xGex/Si(100) heterostructuresJournal article