Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioning

De Gendt, StefanStefanDe GendtBeckx, StephanStephanBeckxCaymax, MattyMattyCaymaxClaes, MartineMartineClaesConard, ThierryThierryConardDelabie, AnneliesAnneliesDelabieDeweerd, WimWimDeweerdKraus, HaraldHaraldKrausOnsia, BartBartOnsiaParaschiv, VasileVasileParaschivPuurunen, RiikkaRiikkaPuurunenRöhr, ErikaErikaRöhrSnow, JimJimSnowTsai, WilmanWilmanTsaiVan Doorne, PatrickPatrickVan DoorneVan Elshocht, SvenSvenVan ElshochtVertommen, JohanJohanVertommenWitters, ThomasThomasWittersHeyns, MarcMarcHeyns2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7403Integration of high-k gate dielectrics - wet etch, cleaning and surface conditioningMeeting abstract