Open-circuit potential analysis as a fast screening method for the quality of high-k dielectric layers

Claes, MartineMartineClaesWitters, ThomasThomasWittersLoriaux, GenevieveGenevieveLoriauxVan Elshocht, SvenSvenVan ElshochtDelabie, AnneliesAnneliesDelabieDe Gendt, StefanStefanDe GendtHeyns, MarcMarcHeynsOkorn-Schmidt, H.H.Okorn-Schmidt2021-10-152021-10-152003https://imec-publications.be/handle/20.500.12860/7325Open-circuit potential analysis as a fast screening method for the quality of high-k dielectric layersProceedings paper