28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow

Chan, BTBTChanTahara, ShigeruShigeruTaharaParnell, DoniDoniParnellRincon Delgadillo, PaulinaPaulinaRincon DelgadilloGronheid, RoelRoelGronheidde Marneffe, Jean-FrancoisJean-Francoisde MarneffeXu, KaidongKaidongXuNishimura, EiichiEiichiNishimuraWerner, ThiloThiloWerner2021-10-212021-10-212013https://imec-publications.be/handle/20.500.12860/2212128nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flowOral presentation