Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealing

Tomida, KazuyukiKazuyukiTomidaPopovici, Mihaela IoanaMihaela IoanaPopoviciOpsomer, KarlKarlOpsomerMenou, NicolasNicolasMenouWang, Wan-ChihWan-ChihWangDelabie, AnneliesAnneliesDelabieSwerts, JohanJohanSwertsSteenbergen, JohnnyJohnnySteenbergenKaczer, BenBenKaczerVan Elshocht, SvenSvenVan ElshochtDetavernier, ChristopheChristopheDetavernierAfanasiev, ValeriValeriAfanasievWouters, DirkDirkWoutersKittl, JorgeJorgeKittl2021-10-182021-10-1820101757-8981https://imec-publications.be/handle/20.500.12860/18097Non-linear dielectric constant increase with Ti composition in high-k ALD-HfTiOx films after O2 crystallization annealingJournal articlehttp://iopscience.iop.org/1757-899X/8/1/012023