Wiaux, VincentVincentWiauxVerhaegen, StafStafVerhaegenCheng, ShauneeShauneeChengIwamoto, FumioFumioIwamotoJaenen, PatrickPatrickJaenenMaenhoudt, MireilleMireilleMaenhoudtMatsuda, TakashiTakashiMatsudaPostnikov, SergeySergeyPostnikovVandenberghe, GeertGeertVandenberghe2021-10-172021-10-172008https://imec-publications.be/handle/20.500.12860/14786Split and design guidelines for double patterningProceedings paper