Yen, AnthonyAnthonyYenTzviatkov, PlamenPlamenTzviatkovWong, AlfredAlfredWongJuffermans, CasperCasperJuffermansJonckheere, RikRikJonckheereJaenen, PatrickPatrickJaenenGarofalo, J.J.GarofaloOtto, O.O.OttoRonse, KurtKurtRonseVan den hove, LucLucVan den hove2021-09-292021-09-291996https://imec-publications.be/handle/20.500.12860/1680Optical proximity correction for 0.3 μm i-line lithographyJournal article