Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nm

Xu, DongboDongboXuGillijns, WernerWernerGillijnsTan, Ling EeLing EeTanPhilipsen, VickyVickyPhilipsenKim, Ryan Ryoung hanRyan Ryoung hanKimRonse, KurtNaulleau, PatrickGargini, PaoloItani, ToshiroHendrickx, Eric2022-06-242022-05-222022-05-232022-06-242021-10-12978-1-5106-4552-30277-786XWOS:000792657300012https://imec-publications.be/handle/20.500.12860/39865Exploration of Alternative Mask for 0.33NA EUV Single Patterning at Pitch 28nmProceedings paper10.1117/12.2599054978-1-5106-4553-0WOS:000792657300012