Job, R.R.JobUlyashin, A.G.A.G.UlyashinMa, Y.Y.MaFahrner, W.R.W.R.FahrnerSimoen, EddyEddySimoenRafi, Joan MarcJoan MarcRafiClaeys, CorCorClaeysNiedernostheide, F.J.F.J.NiedernostheideSchulze, H.J.H.J.Schulze2021-10-142021-10-142002https://imec-publications.be/handle/20.500.12860/6444Low temperature doping of silicon by hydrogen plasma treatmentsProceedings paper