Khurana, DivyanshDivyanshKhuranaPlompen, EmileEmilePlompenRichard, OlivierOlivierRichardVereecken, PhilippePhilippeVereecken2026-01-222026-01-222025-10-232366-9608https://imec-publications.be/handle/20.500.12860/58703Titanium dioxide (TiO2) nanoscaffold thin films consisting of interconnected 3D TiO2 nano-structures with an ordered pore network are fabricated by anodization of titanium nitride (TiN) blanket layers in fluoride-less aqueous electrolytes. The cross-section of the nanoscaffold films resemble a layered TiO2 structure supported by 2 nm wide vertical interconnections. The formation and subsequent release of N2 gas from the oxidation of N3− facilitates the formation of the ordered network of 2–10 nm wide pores, while the oxidation of Ti3+ creates the mesh-like TiO2 structures around them. The TiO2 interconnections give good electronic conductivity, and the connected pores allow access of the active sites in amorphous TiO2 by electrolytes, resulting in a volumetric surface area enhancement of 540x per micron thickness of the film. The films exhibit high charge retention capacity in nonaqueous and even in aqueous electrolytes for a multitude of ions, as demonstrated during electron-coupled ion-insertion reactions for Li+, Na+, K+, and Mg2+. The controlled and targeted growth of the oxide during anodization can further facilitate the formation of patterned structures on masked TiN substrates, making the material attractive for numerous electrochemical applications.engJournal article10.1002/smtd.202501187WOS:001598985100001TITANIUM NITRIDEANATASE TIO2THIN-FILMSOXIDATIONNANOTUBESMECHANISMCOATINGSBEHAVIORGROWTHFABRICATIONMEDLINE:41131817