Fabrication of uniform photonic devices using 193nm optical lithography in silicon-on-insulator

Selvaraja, ShankarShankarSelvarajaBogaerts, WimWimBogaertsVan Thourhout, DriesDriesVan ThourhoutBaets, RoelRoelBaets2021-10-172021-10-172008-06https://imec-publications.be/handle/20.500.12860/14458Fabrication of uniform photonic devices using 193nm optical lithography in silicon-on-insulatorProceedings paper