Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma

Tinck, StefanStefanTinckBoullart, WernerWernerBoullartBogaerts, AnnemieAnnemieBogaerts2021-10-182021-10-1820090022-3727https://imec-publications.be/handle/20.500.12860/16311Investigation of etching and deposition processes of Cl2/O2/Ar inductively coupled plasmas on silicon by means of plasma–surface simulations and experimentsJournal article