Dupuy, EmmanuelEmmanuelDupuyTao, ZhengZhengTaoMertens, HansHansMertensDemuynck, StevenStevenDemuynckHosseini, MaryamMaryamHosseiniZhou, DaisyDaisyZhouWang, ShouhuaShouhuaWangSebaai, FaridFaridSebaaiBatuk, DmitryDmitryBatukHoriguchi, NaotoNaotoHoriguchiChan, BTBTChanLazzarino, FredericFredericLazzarino2025-06-192023-01-092025-06-192023-02-28https://imec-publications.be/handle/20.500.12860/40956Gate patterning development for monolithic CFET integrationOral presentationElectrical & electronic engineeringPlasma etching, Gate, CFET, EUV