Cutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contacts

Hikavyy, AndriyAndriyHikavyyPorret, ClémentClémentPorretMencarelli, M.M.MencarelliLoo, RogerRogerLooFavia, PaolaPaolaFaviaAyyad, MustafaMustafaAyyadBriggs, BasoeneBasoeneBriggsLanger, RobertRobertLangerHoriguchi, NaotoNaotoHoriguchi2021-10-312021-10-312021https://imec-publications.be/handle/20.500.12860/36787Cutting-edge epitaxial processes for sub 3 nm technology nodes: application to nanosheet stacks and epitaxial wrap-around contactsProceedings paperhttps://iopscience.iop.org/article/10.1149/10404.0139ecst/meta